• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
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  • 优先权
    • 专利摘要:
    Deflectometric measurement system (200) of a sample (2) comprising: - a source (10) for generating a light beam in a source plane (105); - an illumination module (19) to form an illumination beam (9) comprising: o a first converging optical element (18); o a first optical selection element (16) having a first opening (160); - Matrix optical modulation means (30) in reflection, to form a pattern (7), said first opening (160) being configured to control the angles of said illumination beam (9) on said matrix optical modulation means (30) ) in reflection; - a Schlieren lens (20) to obtain an angle-intensity coding of said pattern (7) on the sample (2); - imaging means (40) and detection (50) for detecting an image of said sample (2).
    公开号:BE1027225B1
    申请号:E20195272
    申请日:2019-04-24
    公开日:2020-11-23
    发明作者:Philippe Antoine；Didier Beghuin；Luc Jonnas
    申请人:Lambda X；
    IPC主号:
    专利说明:

    [0001] [0001] According to a first aspect, the invention relates to a deflectometric measurement system.
    [0002] [0002] In the optical industry, it is important to characterize optical elements in a precise, complete and if possible automated manner. In particular, when developing or producing bespoke corrective lenses or spectacles with complex curvatures, it is desirable to be able to check that each product conforms to given specifications.
    [0003] [0003] When a refractive object is illuminated, the wavefront passing through it is modified according to the shape and the refractive index of the object. The intensity of the light will also be affected by the optical transmitting properties of the object. Likewise, when light is reflected, the shape of the reflecting surface of the object under study will affect the wavefront and intensity of the returned light. The optical characteristics of the refractive or reflecting object can thus be determined by measuring the changes in the wavefront and / or the intensity of a light beam that has interacted with it.
    [0004] A phase shift measurement method is known for its application in particular in deflectometry, interferometry, or profilometry. Phase shift deflectometry is a proven method for measuring maps of deviations of light by a lens or a mirror. Phase shift deflectometry requires the acquisition of several images for the same object to be measured. Such a method can be used for "real-time" measurements by acquiring multiple images over a sufficiently short time interval.
    [0005] [0005] The phase shift methods are also used in fields other than the characterization of optical elements, such as the inspection of semiconductor wafers, flat glass panels, plastic sheets, etc. where the shape and / or surface finish of optically reflective and / or refractive objects must be inspected accurately and efficiently.
    [0006] [0006] EP 1 454 183 B1 describes a system for measuring optical elements by deflectometry. The system of EP 1 454 183 B1 proposes to acquire several successive images of the same optical element. For each image, there is a projection of a pattern on the object to be analyzed so that the intensity of the pattern on the object to be analyzed varies according to the angles of incidence. The system described in EP 1 454 183 B1 shows limitations in terms of image acquisition speed and measurement precision.
    [0007] [0007] According to a first aspect, one of the aims of the present invention is to provide a deflectometry measurement system which makes it possible to have a higher acquisition speed and better measurement precision.
    [0008] [0008] To this end, the inventors propose a system for measuring a sample by deflectometry comprising: a source for generating a light beam in a source plane; an illumination module comprising: o a first converging optical element; a first optical selection element having a first opening, the first optical selection element being positioned between the source plane and the first converging optical element; - the illumination module is configured to generate an illumination beam from the light beam of the source; - Matrix optical modulation means in reflection, to form a pattern from the illumination beam; the first aperture being configured to control the angles of the illumination beam on the reflection matrix optical modulation means; - a Schlieren lens; the measuring system being configured so that the pattern is able to illuminate the Schlieren lens so as to obtain an angle-intensity coding of the pattern into an inspection light beam;
    [0009] [0009] The deflectometry measurement system of the invention makes it possible to improve the acquisition speed by virtue of an increase in the brightness of the light beam projected onto the object to be studied compared to the solution of EP 1 454 183 B1 . The system of the invention also makes it possible to obtain a better quality of measurement thanks to better control of the intensity as a function of the angle of the light beam projected onto the object to be studied.
    [0010] An advantage of the system of the invention is to allow good measurement precision thanks to the control of stray lights. Controlling stray lights and in particular their reduction or even elimination is a critical parameter because any stray light degrades the quality of the image of the studied object which is recorded by the matrix detection means (camera). Poor control of stray lights can have significant consequences following angle-intensity coding. Indeed, any error in the measurement of the recorded intensity (due to stray lights, for example) can result in an error in estimating the angle of refraction or reflection of the sample. A sample is an optical element studied or an optical element to be measured. An effective solution is to illuminate the optical modulation means with a light beam whose dimensions and divergence are precisely controlled so as to retain only the light rays which will illuminate the useful field of view of the element studied and whose direction is included in the angular acceptance of the optical deflectometry measurement system.
    [0011] The influence of stray lights is reduced with the measuring system of the invention which makes it possible to generate a spatially limited light beam on the matrix modulation means and which comprises a first opening at the level of the first optical selection element, limiting the size of the field of view illuminated by the inspection beam. The first opening corresponds to the field diaphragm of the deflectometry measuring system. The measurement system of the invention makes it possible to image the extended light source on the optical matrix reflection modulation means.
    [0012] [0012] By controlling the field of view and the angular divergence, the measuring system of the invention makes it possible to limit stray lights. In other words, the limitation of parasitic light is obtained by controlling the field of view and the angular divergence. In particular, the ratio between the dimension of the first aperture and the focal length of the first converging optical element of the illumination module makes it possible to control the field of view at the level of the object to be measured.
    [0013] This control of stray lights by the measuring system of the invention is particularly important because the deflectometry measurement is based on a measurement of the intensity which codes the angle of refraction or reflection induced by an optical element to be measured. When the object to be tested is measured, it deflects (by refraction or reflection) an incident beam. For a measurement of the entire test object, the angular distribution of the projected pattern should include at least all of the deflection angles induced by the test object. In order to reduce stray lights, it is desired to have an angular distribution of the pattern projected on the test object which is minimal, that is to say which is adjusted to the test object. For example, if the object to be tested is a lens with a 10 ° deflection of an incident beam, then the angular distribution of the projected pattern is limited to 10 °. If another lens has a deviation of 20 °, then the angular distribution of the projected pattern must be adapted accordingly by increasing the dimension of the spatially limited light beam on the matrix optical modulation means.
    [0014] The system of the invention thus makes it possible to limit the generation of parasitic lights by illuminating the matrix optical modulation means with a beam whose dimensions are precisely controlled so as to keep only the useful light rays. Useful light rays are those which illuminate the field of view of the area to be measured (of the object to be measured) and whose angular distribution corresponds to the object to be measured.
    [0015] The system of the invention allows an increase in the brightness of the projected light beam compared to EP 1 454 183 B1. This is partly achieved by reducing the loss of luminosity during the formation of the projected pattern. The system of the invention indeed proposes a formation of the pattern by means of optical modulation matrix in reflection. Indeed, optical modulation means, making it possible to define the pattern to be projected, when they are used in transmission induce significant losses in luminosity. The use of matrix optical modulation means in reflection, to form the pattern to be projected, allows a significant reduction in losses during the generation of the pattern.
    [0016] The system of the invention makes it possible to have a low dependence, or even independence of the illumination intensity as a function of the direction of light downstream of the optical modulation means relative to EP 1 454 183 BH. If, after interaction with matrix optical modulation means, the propagation of the light beam defining the pattern is not isotropic, that is to say that the intensity of the light depends on its direction, then there will be a variation in intensity which will induce non-uniformity of angle-intensity coding and therefore an error in the measurement of the angle of refraction / reflection of the optical element to be measured. This characteristic is particularly important because the deflectometry measurement is a measurement based on an angle offset measurement which requires the projection of several patterns and therefore inducing (between two projected patterns out of phase) a variation in the intensity of the pattern locally.
    [0017] The measuring system of the invention is particularly precise because the Schlieren lens is configured to compensate for the aberrations induced by the beam separation means for example so as to have a normal incidence on the matrix optical modulation means. Preferably, the Schlieren lens and polarizing splitter cube pair are configured so that they minimize overall aberrations.
    [0018] [0018] Preferably, the first optical selection element having the first opening is positioned in the object focal plane of the first converging optical element. One could call the first convergent optical element of the first convergent optical means, without modifying the meaning of this characteristic.
    [0019] Preferably, the optical matrix modulation means are positioned in an optically conjugated modulation plane of the source plane, the illumination beam being spatially limited at the level of the optical matrix modulation means in reflection according to at least one of the following means : - a second optical selection element having a second opening positioned in the source plane; a third optical selection element having a third opening positioned in the modulation plane; a source comprising a spatially limited light source, preferably the light source is an array of LEDs.
    [0020] [0020] The illumination beam is spatially limited at the level of said optical matrix modulation means, meaning that the illumination beam illuminates the optical matrix modulation means with a predefined dimension. The dimension of the illumination beam is limited in the source plane or in the modulation plane which are optically conjugated. The advantage of spatially limiting the illumination beam at the level of the matrix optical modulation means makes it possible to have an illuminated area on the matrix optical modulation means well defined (spatially limited) by the spatially limited light beam. The first or second optical selection elements are aperture diaphragms of the deflectometry measurement system.
    [0021] [0021] The dimensions of the spatially limited light beam on the matrix optical modulation means allow control of the angular distribution of the projected pattern, thus defining the angular acceptance of the optical system of the invention. It is important that the angular distribution of the projected pattern is consistent with the characteristics of the Schlieren lens.
    [0022] [0022] Preferably, the source comprises a filter for spectrally filtering the light beam.
    [0023] [0023] Preferably, said optical matrix reflection modulation means are positioned in an image plane of the illumination module which is conjugated with said source plane.
    [0024] [0024] Preferably, said first optical selection element is positioned in an object focal plane of the first converging optical element.
    [0025] [0025] This embodiment allows the acquisition by the matrix detection means of an image of an optical element to be measured with very clear contours. This preferred embodiment makes it possible to use an image of an optical element to be measured in its entirety. Preferably, the object focal plane of the first converging optical element is the position where the angles of the illumination beam which illuminates the matrix optical modulation means are best controlled. The purpose of positioning the first aperture in the object focal plane is to control the angles of the illumination beam at the modulation plane. Thus, an offset of the first aperture on either side of the object focal plane of the first converging optical element should be understood to be in the object focal plane. For example, a shift on either side corresponds to a half focal length of the first converging element, more preferably, this shift corresponds to a quarter of a focal length of the first converging optical element.
    [0026] [0026] Preferably, the measuring system further comprises:
    [0027] Preferably, the illumination module is a 4F illumination module comprising: a second converging optical element positioned between the source and the first optical selection element, and configured so that: = "its object focal plane coincides with the source plane; = "its image focal plane coincides with the object focal plane of the first converging optical element positioned between the first and second converging optical elements, the image plane of the illumination module coincides with the image focal plane of the first element optics converge.
    [0028] Preferably, the first and / or the second converging optical element comprises a first and a second converging lens aligned at a distance of between 0 mm and 10 mm.
    [0029] [0029] Preferably, the matrix optical modulation means are matrix phase modulation means.
    [0030] The advantage of using matrix phase modulation means is to allow a fixed (normal) angle of reflection of the illumination beam on the matrix phase modulation means. This makes it possible to simplify the optical design of the deflectometry measurement system of the invention. The use of phase modulation means makes it possible to exploit the polarization properties of light.
    [0031] [0031] Preferably, the matrix phase modulation means comprise a matrix of liquid crystals on silicon.
    [0032] The use of phase modulation means of the liquid crystal matrix type on silicon (or LCOS) is an effective solution making it possible, thanks to the entire system of the invention, to meet all of the drawbacks of the invention. 'state of the art mentioned above: allows better illumination intensity and therefore reduced exposure times per image as well as better measurement precision thanks to the better homogeneity of intensities
    [0033] In order to take full advantage of the liquid crystal matrix on silicon, it is desired to use it with an incident illumination beam (for example collimated) having an incidence perpendicular to its surface, so that the reflected beam is also perpendicular to its surface.
    [0034] Thus, preferably, the measuring system of the invention further comprises: - beam splitter means configured so as to obtain from the illumination beam from the illumination module: a first light beam deflected by the beam splitter along a first optical path directed to the matrix optical modulation means; o a second light beam transmitted by the beam splitter along a second optical path resulting from a reflection of the first light beam deflected by the matrix optical modulation means.
    [0035] [0035] Preferably, the first and second optical paths are parallel.
    [0036] Preferably, the measuring system of the invention further comprises: - beam splitter means configured so as to obtain, from the illumination beam coming from the illumination module: a first light beam transmitted by the beam splitter along a first optical path directed to the matrix optical modulation means; o a second light beam deflected by the beam splitter along a second optical path resulting from a reflection of the first light beam transmitted by the matrix optical modulation means.
    [0037] [0037] Preferably, the first and second optical paths are perpendicular.
    [0038] [0038] Thanks to the beam splitter means, it is possible to simplify the optical design of the projection device thanks to the perpendicular illumination of the surface of the matrix optical modulation means. The beam separation means make it possible to project the pattern by separating the components of the reflected light beam which have undergone a modification of polarization and those which have not undergone a modification of polarization. Thus, the components which define the pattern are those which have undergone a modification of polarization. These components are therefore directed in a direction different from those which have not undergone any modification of their polarization by the matrix optical modulation means. In the case of an LCOS, it is strongly recommended to use a polarizing splitter cube so that the beam reflected by the LCOS is filtered by the splitter cube so that only the components of the beam whose polarization has been modified by the LCOS are projected.
    [0039] The preferred embodiment combining an LCOS with a polarizing cube makes it possible to reduce the luminosity losses by exploiting the polarization properties of light. Indeed, this makes it possible to significantly reduce the inevitable losses during the separation of the two beams: these are greater than 75% with conventional optics (non-polarizing) while they can be reduced to 50% with a polarizing splitter ( for example beam splitter cube).
    [0040] The beam splitter means that can be used are non-exhaustive: semi-reflecting plate, polarizing splitter plate, blade oriented with a Brewster angle, polarizing splitter cube, etc.
    [0041] [0041] Preferably, the beam splitter means comprise a polarizing beam splitter, for example a polarizing beam splitter cube.
    [0042] Preferably, said polarizing beam splitter is configured to obtain from said illumination light beam (for example collimated) from the illumination module: - a first light beam deflected by said polarizing beam splitter along d a first optical path and directed towards said phase modulation means; - a second light beam transmitted by the polarizing beam splitter along a second optical path resulting from a reflection of the first light beam deflected by the two-dimensional phase modulation means.
    [0043] [0043] Preferably, the illumination beam from the illumination module is directed along an optical axis A, the polarizing beam splitter is configured so that the optical axis A is perpendicular to the second optical path.
    [0044] Preferably, the source comprises a light source and a second selection means having a second opening to spatially limit a light beam coming from the light source.
    [0045] [0045] Preferably, the second selection means is positioned in the source plane.
    [0046] Preferably, the source comprises a spatially limited light source, for example the light source is an array of LEDs.
    [0047] [0047] Preferably, the source comprises a matrix of light sources, for example LEDs positioned so as to generate a spatially limited light beam.
    [0048] The second optical selection element makes it possible to spatially limit a light beam generated by one or more light sources.
    [0049] The positioning of the second optical selection element in the source plane makes it possible to be able to image with the illumination module, the second opening on the matrix optical modulation means.
    [0050] Preferably, the light beam is spatially limited according to a spatially limited light beam area Sto, and the matrix optical modulation means have an optical modulation area S30 so that: Ss0__ S120 Vs where y is the factor of magnification of the illumination module, so that: y = h f2 where f corresponds to the focal length of the first converging optical element and fe corresponds to the focal length of the second converging optical element.
    [0051] [0051] Preferably, the first opening has a first opening area of less than 50 mm2, more preferably less than 25 mm and even more preferably less than 10 mm2.
    [0052] Preferably, the first opening is centered on optical axis A.
    [0053] For example, the imaging means can be a so-called 4F system comprising two converging optical elements. The first converging optical element has a focal length of 25mm and the second converging optical element has a focal length of 25mm. Preferably, the first and / or second converging optical elements each comprise a pair of lenses, each lens having a focal length of 50mm. The lenses of a pair of lenses are preferably separated by a distance of between 0 mm and 10 mm, more preferably 1 mm. For example, the magnification of the 4F illumination module is equal to 1. Preferably, an LCOS matrix has a diagonal of 14 mm.
    [0054] Preferably the first opening is a diaphragm. For example, the first opening has a substantially circular opening section, so as to limit the field of view on the test object in a circular manner. This is important in order to limit the stray lights that could be created by illuminating a portion of an optical element to be measured, the optical properties of which are not intended to be measured. For example in the case of measuring an intraocular lens, it would be preferable to illuminate only the portion of the lens having an optical function. However, the measuring system of the invention allows good visualization of the edges or the haptics of an intraocular lens. It is therefore preferable to illuminate the portion having an optical function as well as a portion around it, for example if the portion having an optical function is a disc, it is preferable to illuminate a ring 1 mm thick around the disk.
    [0055] [0055] It is also particularly desirable to have an optical projection device making it possible to measure objects (lenses, mirrors; refractive, diffractive) which have a high optical power.
    [0056] [0056] A preferred embodiment of the measuring system of the invention further comprises:
    [0057] Preferably, the measuring system of the invention further comprises: a non-planar mirror positioned so as to reflect the second light beam, resulting from a reflection on the matrix phase modulation means, in a third light beam reflected towards said beam splitter along a third optical path.
    [0058] In this configuration, the components of the light beam defining the pattern are not directed in the direction of the optical element to be measured after reflection on the matrix optical modulation means. In fact, the components of the pattern are directed, after reflection on the modulation means, towards a non-plane mirror which returns the light into the separator cube. A quarter-wave plate positioned between the non-plane mirror and the splitter cube allows, during the return of the light beam in the cube, a reflection in the beam splitter cube, so as to direct the pattern towards the Schlieren lens and thus , in the direction of the item to be measured. The combination of the Schlieren lens, optical separation medium and non-plane mirror must have good optical properties. The advantage of this embodiment, which makes it possible to generate large angles to characterize an optical element to be measured with high optical power, is that the double passage through the beam splitter cube thanks to the reflection on the non-plane mirror makes it possible to 'obtain good optical properties. Thus, when designing the Schlieren lens, it must be designed so as to correct the defects introduced by the cube and the non-plane mirror.
    [0059] [0059] Advantageously, the non-plane mirror is concave. Preferably, the non-plane mirror is a concave mirror having a radius of curvature between 25 mm and 100 mm, more preferably between 25 mm and 75 mm, for example the non-plane mirror is a spherical concave mirror having a radius of curvature of 50 mm. For example, the spherical mirror has a diameter of between 10 mm and 50 mm, for example a diameter of 25.4 mm.
    [0060] Advantageously, the beam splitter is a polarizing beam splitter and the measuring system of the invention further comprises: - a quarter wave plate positioned between the converging mirror and the polarizing beam splitter means.
    [0061] Preferably, the polarizing light beam splitter is configured so that the third light beam reflected by the non-plane mirror along said third optical path) is deflected by the polarizing beam splitter into a fourth light beam according to a fourth optical path.
    [0062] Preferably, the polarizing light beam splitter is configured such that the third light beam reflected along the third optical path is transmitted by the polarizing beam splitter in a fourth light beam along a fourth optical path.
    [0063] In this embodiment, the third and fourth optical paths and the third and fourth light beams are combined.
    [0064] Preferably, the measuring system of the invention is configured so that: - the second and third optical paths are essentially parallel, and, - the optical axis A or the illumination beam and the fourth optical path are essentially parallel.
    [0065] [0065] Preferably, the Schlieren lens is positioned between the projection device and the imaging means.
    [0066] [0066] Preferably, the Schlieren lens is positioned between said illumination module and the imaging means. Preferably, the Schlieren lens is positioned between the beam splitter cube and the imaging means.
    [0067] The performance of the Schlieren lens is particularly critical because the Schlieren lens defines the encoding of the angle of refraction of light by the optical element to be measured (the angle of reflection of light by the mirror at measure) in intensity. Ideally, this encoding is independent of the position in the field of view. In other words, this coding is the same for all the positions on the optical element to be measured. This condition depends on two different factors. The first is the absence of distortion. In practice, a pattern generated by the matrix optical modulation means and corresponding to a source point should ideally generate a collimated beam, that is to say a light beam of which all the rays are parallel to one another. This beam can be tilted relative to the optical axis. This distortion degrades the performance of the instrument or makes its calibration more complex. Indeed, the intensity coding depends on the position in the field of view and possibly on the working distance (distance between the Schlieren lens and the optical element to be measured. , any aberration of the Schlieren lens will result in a loss in angular resolution. Indeed, in a simplified vision, the light collected by each of the pixels of the image (image detected by the matrix detection means) of the element optical to be measured comes from a single position on the optical matrix modulation means. At each pixel of the image on the camera, light comes from a position on the optical matrix modulation means. This single position is in practice a restricted surface defined by the dimension of the fourth opening of the imaging means (in front of the camera). The fourth opening is for example a diaphragm. Any aberrations of the Schlieren lens help to expand this surface area, which degrades the performance of the instrument. The Schlieren lens is an objective made up of several lenses, the complexity of which depends critically on the angular acceptability of the optical instrument, the size of the matrix optical modulation means and the size of the field of view. More precisely, the complexity increases for large angles and small size matrix optical modulation means.
    [0068] When using a liquid crystal matrix on silicon in combination with a polarizing splitter cube, the latter introduces optical aberrations which are likely to significantly deteriorate the performance of the instrument. The design of the Schlieren lens compensates for these aberrations so that the aberrations of the splitter cube and Schlieren lens combination are minimal. During the design of the Schlieren lens, the aberrations of the beam splitter cube (and possibly of the non-plane mirror) are directly integrated into the modeled optical elements so as to obtain a Schlieren lens offering very good correction of the aberrations introduced by the beam splitter cube.
    [0069] The Schlieren lens is positioned on an optical path between the matrix phase modulation means and the imaging means.
    [0070] Preferably, the imaging means comprise: a first and a second convergent imaging optical elements configured so that an image focal point of one coincides with an object focal point of the other at a second point of convergence located in a second focusing plane positioned between said first and second converging optical imaging elements, said imaging means being able to form an image of the sample from the inspection beam having interacted with the sample on the matrix detection means.
    [0071] Preferably, the imaging means further comprise: a fourth optical selection element having a fourth opening surrounding the second point of convergence.
    [0072] [0072] When measuring an optical element in reflection, it is preferable in the case of a concave mirror, for example, to measure it parallel to its optical axis. Thus, it is particularly advantageous to position the optical element to be measured so that its optical axis is parallel to the second optical path of the second light beam having interacts with the matrix optical modulation means. Thus the Schlieren lens is positioned between the element to be measured and the beam splitter means so that the light beam reflected by the optical element to be measured in reflection passes again through the Schlieren lens. A quarter-wave plate is then positioned between the optical element to be measured and the polarizing beam splitter means so that the light beam reflected by the optical element to be measured in reflection is deflected by the polarizing beam splitter means in the direction imaging means then the optical matrix detector (the quarter-wave plate can be located between the cube and the Schlieren lens or between the Schlieren lens and the mirror to be tested). In this case, the Schlieren lens is both the proper Schlieren lens and the first imaging optical element of the imaging system. This is particularly advantageous and makes it possible to have a particularly compact measuring system with a reduced number of optical components.
    [0073] The interaction of the analysis beam with the optical element to be measured is a transmission of the analysis beam with the sample in the case of a refractive or diffractive sample or a reflection in the case of a sample reflective.
    [0074] Preferably, the fourth opening is positioned at the level of the image focal point of the first imaging optical element and the object focal point of the second imaging optical element so as to essentially allow the portion of the light beam propagating parallel to the object to pass through. 'optical axis A.
    [0075] [0075] Preferably, the Schlieren lens is the first optical imaging element. Thus the Schlieren lens allows the angle-intensity coding of the inspection beam and makes it possible to obtain an image thanks to the imaging means of which it is also part.
    [0076] Preferably, the imaging means are 4F imaging means so that: the first converging optical element is positioned between the Schlieren lens and the fourth selection means, so that its object focal plane coincides with a plane of said sample and, the second converging optical element is positioned between the fourth selection means and the matrix detection means, so that its image focal plane coincides with the matrix detection means.
    [0077] The different embodiments of the optical measurement system of the invention can be implemented alone or in combination.
    [0078] [0078] The optical axis A in the optical system of the invention is considered to be deflected when the light beam is deflected by reflecting elements. Brief description of the figures
    [0079] These aspects as well as other aspects of the invention will be clarified in the detailed description of particular embodiments of the invention, reference being made to the drawings of the figures, in which: - Figure 1 shows a schematic representation of the measuring system of the invention; - Figures 2a, 2b, 3a, 3b, 4a, 4b show embodiments of a projection device of the measuring system of the invention; - Figure 3c shows an embodiment of the source and the illumination module; - Figure 5 shows an embodiment of the source; FIG. 6 shows an embodiment of the matrix optical modulation means; - Figures 7, 8a, 8b, 9, 10a and 10b show embodiments of the measuring system of the invention. The drawings of the figures are not to scale. Generally, like elements are denoted by like references in the figures. The presence of reference numbers in the drawings cannot be considered as limiting, including when these numbers are indicated in the claims. Detailed description of certain embodiments of the invention
    [0080] FIG. 1 shows a schematic representation of the deflectometry measurement system 200 of the invention. The measuring system 200 comprises a projection device 100 making it possible to project onto the optical element to be measured 2, a pattern whose angle of incidence of this pattern on the optical element to be measured 2 is controlled with precision by the device. projection. The measuring system 200 further comprises imaging means 40 for forming an image of the optical element to be measured 2 on matrix detection means 50.
    [0081] FIG. 2a shows a projection device 100 according to one embodiment of the invention. This projection device 100 comprises a light source 10 spatially limited along a light source surface S10.
    [0082] FIG. 2b is an embodiment close to that of FIG. 2a. It nevertheless differs in that the matrix optical modulation means 30 are positioned so that when the first light beam 91 along a first optical path 61 is reflected in a second light beam 92 by the matrix optical modulation means 30 in reflection according to a direction normal thereto along a second optical path 62, the light beam splitting means 60 are configured to transmit at least a portion of the first light beam 91 and to reflect at least a portion of the second light beam 92. The splitter means beam 60 make it possible to reflect at least a portion of the reflected light beam 92 by the matrix optical modulation means 30 towards a Schlieren lens 20. The illumination beam 9 becomes the first light beam 91 along a first optical path 61 after its transmission in the separation means
    [0083] The matrix optical modulation means 30 in reflection are configured to reflect the image of the light source 10 with a pattern 7 which, after passing through the Schlieren lens 20, makes it possible to obtain an inspection beam for a system. measurement by deflectometry 200. According to a preferred embodiment, the source 10 is configured to emit a light beam spatially limited in the source plane 105. The pattern 7 thus formed by the projection device of the invention 100 is created by the point by point (pixel by pixel) activation or non-activation of the matrix optical modulation means 30 in reflection. The activation of the optical matrix modulation means 30 in reflection allows for example a spatial deviation, a modification of the phase, a modification of a reflection factor. The modulation can therefore be carried out in intensity or in phase to illuminate the Schlieren lens 20 with the pattern 7. The phase modulation requires a polarizing optical element to convert the phase modulation into an intensity modulation, which is essential in the case. of the application of the projection device 100 for a measurement by deflectometry. A polarizing optical element is for example a polarizer. The phase modulation generates a modulation of the polarization of the light which is itself analyzed by the polarizer.
    [0084] FIG. 3a shows another embodiment of the projection device 100 of the invention. The projection device 100 comprises a light source 100 spatially limited according to an emission surface S10. The projection device 100 comprises an illumination module 19, which is a 4F imaging system, for forming an image of the spatially limited light source 10 in the source plane 105 on the matrix optical modulation means 30. The module d The illumination 19 comprises a first 18 and a second 14 converging optical elements, for example converging thin lenses or pairs of converging thin lenses. The first 18 and second 14 converging optical elements are positioned so that the image focal plane of the second optical element 14 coincides with the object focal plane of the first optical element 18. Thus, according to a preferred embodiment, thanks to the illumination module 19, an image of the light source 10 is obtained on the matrix optical modulation means 30 in reflection. The projection device further comprises a first optical selection element 16 having a first opening 160. This first opening 160 is positioned so as to surround a point of convergence 150 corresponding to the coincidence of the image focal point of the second converging optical element 14 and of the focus of the first optical element converge 18. Thus, the first aperture 160 makes it possible to control the maximum angular opening (maximum angular distribution) (at the level of the matrix optical modulation means and not at the level of the object to be tested) of the beam light generated by the source 10 which has too great a divergence / convergence. Indeed, the light beam coming from the source 10 is focused and only the light beams entering parallel to the optical axis of the second optical element converge 14 pass through its image focal point located on the optical axis A. The second opening 160 allows from when limiting the passage of the components of the light beam passing through the first optical element converge 18.
    [0085] The first convergent optical element 18 has a focal length f :. The second converging optical element 14 has a focal length fz.
    [0086] In FIG. 3a, the device 100 comprises beam splitter means 60 which make it possible to illuminate the optical modulation means 30 with a chosen angle. Here, the beam splitter means 60 make it possible to illuminate the optical modulation means 30 with the illumination beam 9 (preferably collimated) which becomes the first light beam 91 along a first optical path 61 describing an angle of 90 ° by with respect to the matrix phase modulation means 30. A portion of the illumination beam 9 (collimated) is transmitted by the beam splitter means 60 (not shown) and a portion is reflected towards the optical modulation means.
    [0087] FIG. 3a, in the case of beam splitter means 60 which are a polarizing cube, the illumination beam 9 which becomes the first light beam 91 when it is deflected by the cube corresponds to a polarization of the beam ( collimated). The reflection of the first light beam 91 on the matrix phase modulation means 30 makes it possible to selectively modify the polarization of the portions of the second light beam 92. Preferably, the matrix phase modulation means 30 make it possible to modify the polarization selectively with a phase shift. 90 ° with respect to the polarization of the first light beam 91. Thus, the portions of the second light beam 92 having undergone a phase shift of 90 ° are transmitted by the cube 60 while the portions of the second light beam 92 having not undergone phase shift are reflected by the cube 60 (towards the source). In this way, a pattern 7 can illuminate the Schlieren lens and be projected by the projection device 100 onto the optical element to be measured 2 with angle-intensity coding for measurement by deflectometry. According to a particular embodiment, it is possible to have a non-binary image by adjusting the fraction of the time during which the polarization is modified.
    [0088] FIG. 3b shows a variant of FIG. 3a where the phase modulation means are positioned so as to be illuminated by the portion of the beam (collimated) which is transmitted by the cube 60 rather than by the portion of the beam ( collimated) which is reflected / deflected by cube 60 (as in the case of Figure 3a). Thus the phase modulation means make it possible to induce a phase shift of 90 ° to the illumination beam 9 which becomes the first light beam 91 selectively so as to form a pattern 7. Thus, the portions of the second light beam 92 having subjected to this phase shift of 90 ° are reflected by the cube 60 while the portions (not shown) which have not undergone a phase shift are transmitted by the cube 60. The pattern 7 projected onto the Schlieren lens 20 by the second light beam 92 after it has passed through the cube 60 (reflection) can therefore be used for a deflectometric measurement.
    [0089] Figure 3c shows an embodiment of the illumination module according to Figures 3a, 3b, 4a and 4b. In this embodiment, the first 18 and second 14 converging optical elements each include a pair of converging lenses. This embodiment makes it possible to use commercially available pairs of lenses and to use them to achieve shorter focal lengths. For example, the pairs of lenses 141, 142; 181, 182 include two lenses 141, 142; 181, 182 of 50 mm focal length, which make it possible to obtain the first 18 and second 14 converging optical elements of 25 mm focal length. The lenses 141, 142; 181, 182 of each pair being, for example, 1 mm apart from each other.
    [0090] Figure 4a shows the projection device of Figure 3a further comprising a non-plane mirror 70 for reflecting the second light beam 92 in the direction of the cube 60, in a third light beam
    [0091] The device of Figure 4a comprising the non-plane mirror 70 and a quarter-wave plate can be configured from the device 100 described in Figure 3b, by modifying the position of the elements relative to the cube 60. The advantage of being able to modify the position of the elements around the cube 60 makes it possible to make the device adaptable to different applications requiring various dimensions.
    [0092] The device of Figure 4b shows a combination of Figure 4a with the imaging module 19 of Figure 2a.
    [0093] Figure 5 shows a spatially limited light source 10 comprising a light source 15 and a second optical selection element 12 having a second opening 120. The second opening 120 is formed in the second optical selection element 12. For example, the second opening 120 has a rectangular, square, elliptical or circular section. The second aperture 120 has an area of second aperture S120 which corresponds to the area of the recessed portion of the second optical selection element.
    [0094] FIG. 6 shows an embodiment of the matrix optical modulation means 30 comprising third selection means 36 having a third opening 360. The third opening 360 is positioned in the plane 195 of the matrix optical modulation means 30, of so as to spatially limit the light beam reflected by the optical matrix modulation means 30. The optical matrix modulation means 30 of FIG. 6 can be adapted to all the embodiments of the measuring system 200 of the present invention.
    [0095] Figures 7, 8a, 8b and 9 illustrate several embodiments of the deflectometric measurement system 200 according to the invention.
    [0096] FIG. 7 illustrates an embodiment of the deflectometry measurement system 200 of the invention. The measuring system 200 comprises the projection device 100 which makes it possible to project the pattern 7 after its passage through the Schlieren lens 20 in the direction of the optical element to be measured 2. Then an image of the element to be measured 2 is formed. on the matrix detection means 50 thanks to the imaging means 40. The matrix optical modulation means and the matrix imaging means are synchronized so that an image is acquired for each pattern projection 7. For each image acquired successively , the pattern 7 is phase shifted on the Schlieren lens 20 with respect to the previous image, so as to obtain a variation of the angles of the pattern 7 on the optical element to be measured 2. The illumination module 19 corresponds to the one of the illumination module 19 shown and described in Figures 2a, 2b, 3a, 3b, 3c, mutatis mutandis.
    [0097] The rate of measurement of an optical element to be measured 2 is in part defined by the speed of the optical modulation means 30. A possible option to achieve higher speeds is to display a binary pattern 7 and not a pattern 7 sinusoidal. Indeed, the binary pattern 7 will be transformed into a pattern 7 close to a sinusoid after convolution with the response of the matrix optical modulation means 30. It should be noted that this conversion is never perfect. Also, the gain in speed results in a loss in optical performance in general and in angular resolution in particular. It is also possible to generate a non-binary image on the matrix detection means 50 with a binary pattern 7 by varying the time during which the pattern 7 is displayed by the optical matrix modulation means 30. This is possible provided that said pattern 7 is displayed. time is shorter than the integration time used by the matrix detection means 50 and that the matrix detection means 50 and the matrix optical modulation means 30 are synchronized.
    [0098] FIG. 8a shows an embodiment of the measuring system 200 comprising, in addition to the embodiment of FIG. 7, a polarizing beam splitter cube 60 positioned between the Schlieren lens 20 and the phase modulation means 30 , so that the components of the second light beam 92 having undergone a phase modulation during the reflection of the first light beam 91 on the phase modulation means 30 are transmitted by the cube 60 along the second optical path 62. It is possible to implement the embodiment of the projection device 100 of FIG. 3b in which the beam splitter cube 60 is positioned between the illumination module 19 and the phase modulation means 30, so that the components of the second light beam 92 having undergone a phase modulation during the reflection of the first light beam 91 on the phase modulation means 30 are reflected by the cube 60 according to the second optical path 62.
    [0099] FIG. 8b shows an embodiment of the measuring system 200 for measuring optical elements 2 in reflection. The measuring system 200 comprises the projection device 100 configured to project the pattern 7 onto the optical element to be measured 2. The projection device 100 comprises the splitter cube 60 making it possible to form the pattern 7 from the beam reflected on the means. phase modulation matrix 30. The pattern 7 is projected through the Schlieren lens 20 to the optical element to be measured 2 on which it is reflected to pass again through the Schlieren lens 20 in the direction of the cube
    [0100] [0100] FIG. 9 shows an embodiment of the measuring system 200 comprising the projection device 100 of FIG. 4a or 4b. Preferably, a polarizer (not shown) is positioned between the illumination module 19 and the beam splitter means 60 in order to prevent all the light from the illumination beam from being directly transmitted by the light beam splitting means. 60. The fourth light beam 94 defining the pattern 7 passes through the Schlieren lens 20 to code the angle of the inspection beam 99 as a function of the intensity of the patterns. The inspection beam is preferably projected by the projection device 100 along the fourth optical path 64 the optical element to be measured 2. An image of the optical element to be measured is formed on the matrix detection means 50 thanks to the means imaging 40. This embodiment is particularly well suited to measurements of optical elements 2 having a high optical power, for example greater than 20D and even more suitable for optical powers greater than 25 D. Optical elements 2 having high optical power are for example intraocular lenses.
    [0101] [0101] FIG. 10a shows an example of the projection device 100 similar to that of FIGS. 3a and 3b but not requiring beam splitter means.
    [0102] [0102] Figure 10b shows an example of the projection device 100 similar to that of Figures 2a and 2b but not requiring beam splitter means. The projection devices 100 of Figures 10a and 10b can be used in the embodiments of the deflectometric measurement systems of Figures 7, 8a, 8b, 9, and in particular with that of Figure 7.
    [0103] The present invention has been described in relation to specific embodiments, which have a purely illustrative value and should not be considered as limiting. In general, the present invention is not limited to the examples illustrated and / or described above. The use of the verbs "to understand", "to include", "to include", or any other variant, as well as their conjugations, can in no way exclude the presence of elements other than those mentioned. The use of the indefinite article "a", "a", or of the definite article "the", "the" or "the", to introduce an element does not exclude the presence of a plurality of these elements. Reference numbers in the claims do not limit their scope.
    [0104] [0104] In summary, the invention can also be described as follows. Measurement system 200 by deflectometry of a sample 2 comprising:
    [0105] [0105] In summary, the invention can also be described as follows. System 200 for deflectometrically measuring a sample 2 comprising: - a source 10 for generating a light beam in a source plane 105 - an illumination module 19 for forming an illumination beam (9) comprising: a first element convergent optics 18; o a first optical selection element 16 having a first opening 160; - Matrix optical modulation means 30 in reflection, to form a pattern 7, said first opening 160 being configured to control the angles of said illumination beam 9 on said optical matrix modulation means 30 in reflection;
    a Schlieren lens 20 to obtain an angle-intensity coding of said pattern 7 on sample 2; - Imaging 40 and detection 50 means for detecting an image of said sample 2.
    权利要求:
    Claims (31)
    [1]
    1. System (200) for deflectometrically measuring a sample (2) comprising: - a source (10) for generating a light beam in a source plane (105); - an illumination module (19) comprising: o a first converging optical element (18); o a first optical selection element (16) having a first aperture (160), said first optical selection element (16) being positioned between said source plane (105) and said first converging optical element (18); said illumination module (19) is configured to generate an illumination beam (9) from said light beam of said source (10) - matrix optical modulation means (30) in reflection, to form a pattern (7 ) from said illumination beam (9); said first opening (160) being configured to control angles of said illumination beam (9) on said optical matrix modulation means (30) in reflection; - a Schlieren lens (20); said measuring system (200) being configured such that said pattern (7) is able to illuminate said Schlieren lens (20) so as to obtain angle-intensity coding of said pattern (7) into an inspection light beam ( 99); - Imaging means (40) for forming an image of said sample (2) after interaction of said inspection light beam (99) with said sample (2); - matrix detection means (50) for detecting said image of said sample (2) formed by said imaging means (40).
    [2]
    2. Measuring system (200) according to the preceding claim characterized in that said optical matrix modulation means (30) are positioned in a modulation plane (195) optically conjugated to said source plane (105), said illumination beam ( 9) being spatially limited at the level of said optical matrix modulation means (30) in reflection according to at least one of the following means: - a second optical selection element (12) having a second opening (120) positioned in said source plane (105); - a third optical selection element (36) having a third opening (360) positioned in said modulation plane (195); - a source (10) comprising a spatially limited light source (15), preferably said light source (15) is an array of LEDs.
    [3]
    3. Measuring system (200) according to any one of the preceding claims characterized in that said first optical selection element (16) is positioned in an object focal plane (185) of said first converging optical element (18).
    [4]
    4. Measuring system (200) according to any one of the preceding claims characterized in that it further comprises: - a third optical selection element (36) having a third opening (360), said third optical selection element (36) being positioned at said optical matrix modulation means (30).
    [5]
    5. Measuring system (200) according to any one of the preceding claims characterized in that: - said illumination module (19) is a 4F illumination module comprising: o a second optical element (14) converging positioned between said source (10) and said first selector optical element (16), and configured such that: = "its object focal plane coincides with said source plane (105); 2 its image focal plane coincides with said object focal plane (185) ) of said first converging optical element (18) positioned between said first (18) and second (14) converging optical elements, said image plane (195) of the illumination module (19) coincides with the image focal plane of the first optical element ( 18) converge.
    [6]
    6. Measuring system (200) according to any one of the preceding claims characterized in that said optical matrix modulation means (30) are matrix phase modulation means (30).
    [7]
    7. Measuring system (200) according to the preceding claim characterized in that the matrix phase modulation means (30) comprise a matrix of liquid crystals on silicon.
    [8]
    8. Measuring system (200) according to any one of the preceding claims characterized in that it further comprises: - beam splitter means (60) configured so as to obtain from said illumination beam (9) from said illumination module (19) o a first light beam (91) deflected by said beam splitter (60) along a first optical path (61) directed towards said matrix optical modulation means (30); o a second light beam (92) transmitted by said beam splitter (60) along a second optical path (62) resulting from a reflection of said first deviated light beam (91) by said optical matrix modulation means (30 ).
    [9]
    9. Measuring system (200) according to the preceding claim characterized in that said first (61) and second (62) optical paths are parallel.
    [10]
    10. Measuring system (200) according to any one of claims 1 to 5 characterized in that it further comprises: - beam splitter means (60) configured so as to obtain from said illumination beam ( 9) from the illumination module (19):
    o a first light beam (91) transmitted by said beam splitter (60) along a first optical path (61) directed towards said optical matrix modulation means (30); o a second light beam (92) deflected by said beam splitter (60) along a second optical path (62) resulting from a reflection of said first light beam (91) transmitted by said optical matrix modulation means (30 ).
    [11]
    11. Measuring system (200) according to the preceding claim characterized in that said first (61) and second (62) optical paths are perpendicular.
    [12]
    12. Measuring system (200) according to any one of the four preceding claims when dependent on claim 7 characterized in that the beam splitter means (60) comprise a polarizing beam splitter (60), preferably a beam splitter (60). polarizing beam splitter cube (60).
    [13]
    13. Measuring system (200) according to the preceding claim characterized in that said illumination beam (9) from said illumination module (19) is directed along an optical axis A, said polarizing beam splitter ( 60) is configured such that the optical axis A is perpendicular to said second optical path (62).
    [14]
    14. Measuring system (200) according to any one of the preceding claims characterized in that said source (10) comprises a light source (15) and a second selection means (12) having a second opening (120) for limiting spatially a light beam coming from said light source (15).
    [15]
    15. Measuring system (200) according to the preceding claim characterized in that said second selection means (12) is positioned in said source plane (105).
    [16]
    16. Measuring system (200) according to any one of the preceding claims characterized in that said source (10) comprises a spatially limited light source (15), preferably said light source is an array of LEDs.
    [17]
    17. Measuring system (200) according to any one of the preceding claims when dependent on claim 5 characterized in that: - said light beam is spatially limited according to a spatially limited light beam area S70, and, - said means of optical modulation matrixes (30) have an optical modulation area S30 such that: S30 10 Ys where y is the magnification factor of the illumination module (19) according to claim 2, so that: y = A f2 where f corresponds to the focal length of the first converging optical element (18) and f corresponds to the focal length of the second converging optical element (14).
    [18]
    18. Measuring system (200) according to any one of the preceding claims characterized in that said first opening (16) has an area of first opening (160) less than 50 mm2, preferably less than mm and even more preferably less than 10 mm °. 25
    [19]
    19. A measuring system (200) according to any one of the preceding claims characterized in that said first opening (160) is centered on said optical axis A.
    [20]
    20. A measuring system (200) according to any one of the preceding claims when dependent on claim 10 characterized in that it further comprises:
    - a non-plane mirror (70) positioned so as to reflect said second light beam (92), resulting from a reflection on said matrix phase modulation means (30), in a third light beam (93) reflected towards said beam splitter (60) along a third optical path (63).
    [21]
    21. Measuring system (200) according to the preceding claim characterized in that the non-plane mirror is concave.
    [22]
    22. Measuring system (200) according to the preceding claim characterized in that the beam splitter (60) is a polarizing beam splitter and in that it further comprises: - a quarter wave plate positioned between said mirror converging (70) and said polarizing beam splitter means (60).
    [23]
    23. Measuring system (200) according to claims 18 and 20 characterized in that said polarizing light beam splitter (60) is configured such that said third light beam (93) reflected by said non-plane mirror (70) according to said third optical path (63) is deflected by said polarizing beam splitter (60) into a fourth light beam (94) along a fourth optical path (64).
    [24]
    24. Measuring system (200) according to claims 18 and 20 characterized in that said polarizing light beam splitter (60) is configured so that said third reflected light beam (93) along said third optical path (63) is transmitted. by said polarizing beam splitter (60) into a fourth light beam (94) along a fourth optical path (64).
    [25]
    25. A measuring system (200) according to any one of the two preceding claims characterized in that it is configured so that: - said second (62) and third (63) optical paths are essentially parallel, and,
    - Said optical axis A and said fourth optical path (64) are essentially parallel.
    [26]
    26. A measuring system (200) according to any one of the preceding claims characterized in that said Schlieren lens (20) is positioned between said projection device (100) and said imaging means (40).
    [27]
    27. Measuring system (200) according to any one of the preceding claims characterized in that said Schlieren lens (20) is positioned on an optical path between said matrix phase modulation means (30) and said imaging means. (40).
    [28]
    28. Measuring system (200) according to any one of the preceding claims characterized in that said imaging means (40) comprise: a first (20; 420) and a second (400) convergent imaging optical elements configured so that an image focal point of one coincides with an object focal point of the other at a second point of convergence located in a second focusing plane (405) positioned between said first (20; 420) and second (400 ) converging imaging optical elements, said imaging means (40) being adapted to form an image of said sample (2) from said inspection beam (99) having interacted with said sample (2) on said detection means matrix (50).
    [29]
    29. Measurement system (200) according to the preceding claim characterized in that said imaging means (40) further comprise: - a fourth optical selection element (45) having a fourth opening surrounding said second point of convergence.
    [30]
    30. Measuring system (200) according to the preceding claim characterized in that said fourth opening is positioned at the level of the image focus of said first imaging optical element (20; 420) and of the object focus of said second imaging optical element ( 400) so as to essentially let pass the portion of the light beam propagating parallel to the optical axis A.
    [31]
    31. A measuring system according to any one of the preceding claims characterized in that said imaging means (40) are 4F imaging means so that: said first optical element (20; 420) converge is positioned between said Schlieren lens (20) and said fourth selection means (45), so that its object focal plane coincides with a plane of said sample (2) and, o said converging second optical element (400) is positioned between said fourth means selection (45) and said matrix detection means (50), so that its image focal plane coincides with said matrix detection means (50).
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    同族专利:
    公开号 | 公开日
    EP3959508A1|2022-03-02|
    BE1027225A9|2021-01-27|
    BE1027225A1|2020-11-19|
    WO2020216914A1|2020-10-29|
    BE1027225B9|2021-02-03|
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    US4728185A|1985-07-03|1988-03-01|Texas Instruments Incorporated|Imaging system|
    WO2003048837A2|2001-12-05|2003-06-12|Universite Libre De Bruxelles|Apparatus and process for characterising samples|
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    法律状态:
    2021-01-15| FG| Patent granted|Effective date: 20201123 |
    优先权:
    申请号 | 申请日 | 专利标题
    BE20195272A|BE1027225B9|2019-04-24|2019-04-24|Deflectometry measuring system|BE20195272A| BE1027225B9|2019-04-24|2019-04-24|Deflectometry measuring system|
    PCT/EP2020/061480| WO2020216914A1|2019-04-24|2020-04-24|Deflectometry measurement system|
    EP20720073.4A| EP3959508A1|2019-04-24|2020-04-24|Deflectometry measurement system|
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